FEGA FEGA, or Field Emission Gun Array, is a type of electron source used in electron beam (EB) laser engraving systems. FEGA technology employs a matrix of field emission cathodes to generate a tightly focused electron beam that interacts with a photosensitive coating on the surface of the engraving substrate. FEGA-based EB engraving offers high-speed and high-resolution capabilities, making it suitable for producing fine details and intricate patterns on a variety of materials, including metal, plastic, and ceramic substrates. |